| CMOSP8C/Standard (TeledyneDALSA) | 0.8-micron 2.7V-5.5V mixed-signal CMOS;
Double poly; Triple metal; Hi-res poly option [10kOhms/sq];
Twin-tub process on N-type or P-type wafers
Average Cycle Time: 27 Weeks |
| CMOSP8G/HighVoltage (TeledyneDALSA) | 0.8-micron 5V mixed-signal; CMOS 40-300V DMOS and PMOS transistors; 5V CMOS isolated from
40-300V CMOS; PNP bipolar and isolated NPN bipolar; Dual gate oxide technology; Hi-res poly option
[5kOhms/sq]; double poly capacitors; triple metal with TiN barrier; P-type epitaxy over p+ substrate
Average Cycle Time: 27 Weeks |
| IMEC SOI | IMEC Standard SiPhotonics |
| Sensonit/ (Micronit) | Sensonit: customized depth microchannels and integrated electrodes on glass substrates
with optional ITO in-channel electrode or back side metal electrode
Average Cycle Time: 12 Weeks |
| UW-MEMS/ (CIRFE) | Two gold layers surface micromaching process on alumina substrate
Turnaround time: TBA |
| NanoSOI | Nanopatterning of metal and silicon using e-beam litho. Process conducted on SOI with optional oxide etch.
Average turnaround time is 9 weeks.
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| LTCC | Custom configurations and stack up are available on demand. Please contact CMC for details |
| FlowJEM | Quick turnaround, cost effective rigid polymer fabrication technology
for microfluidic devices
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